Albany Nano Tech Used The World's First 193 Nm Pre Production Immersion Lithography System

Albany NanoTech announces that the College for Nanoscale Sciences and Engineering has installed and is using the world's first 193 nm pre-production immersion lithography system for the development of 300 mm wafer technology. The instillation and use of the immersion lithography system involves the cooperation of ASML, IBM, and Tokyo Electron Limited (TEL).

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Academic Colleges, Schools & Departments

Source Details

"Shonna Koegan, "Albany NanoTech Installs First-of-Its-Kind Immersion Lithography System," Update, September 10, 2004, p. 8